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MKS AX-7670 0190-47768 AMAT HDP CVD – Advanced Plasma Technology for Semiconductor Manufacturing

The MKS AX-7670 is an advanced control module designed for High Density Plasma Chemical Vapor Deposition (HDP CVD) systems used in semiconductor manufacturing processes. It ensures precise gas flow control and stable operation under demanding industrial conditions.

MKS AX-7670 0190-47768 AMAT HDP CVD – Advanced Plasma Technology for Semiconductor Manufacturing

    The MKS AX-7670 0190-47768 AMAT HDP CVD is a specialized semiconductor manufacturing process module designed for high-density plasma chemical vapor deposition (HDP-CVD). It provides superior film quality and uniformity, essential for advanced semiconductor fabrication processes.

Manufacturer:MKS Instruments

Model Number:AX-7670

Submodel Number:0190-47768

Module Category:Plasma Enhancer

Voltage:200V-240V AC

Power Consumption:500W

Operating Temperature Range:-20°C to 60°C

Dimensions:22.86cm x 30.48cm x 15.24cm

Weight:7.2kg

Certifications:CE, RoHS

    Designed for demanding semiconductor applications, the MKS AX-7670 delivers unparalleled precision in plasma etching.

     With its innovative HDP-CVD technology, this module ensures consistent etching results across large wafers, enhancing the quality and reliability of semiconductor devices.

     The robust design includes a user-friendly interface and a modular architecture, allowing for easy maintenance and upgrades.

     Each unit undergoes rigorous testing to meet CE, UL, and RoHS standards, ensuring safety and compliance.

     Choose the MKS AX-7670 for superior performance in your advanced fabrication processes.

MKS AX-7670   0190-47768  AMAT HDP CVD

MKS AX-7670   0190-47768  AMAT HDP CVD

MKS AX-7670   0190-47768  AMAT HDP CVD




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