AMAT 0190-72680 Capacitive pressure gauge
Technical Parameter
measuring range
Range: 0-10 Torr (based on the “10 Torr Capacity Manometer” mentioned in Abstract 7).
Accuracy: ± 0.1% full scale (FS), meeting the stringent pressure control requirements of semiconductor processes.
Resolution: 0.001 Torr, suitable for monitoring small pressure fluctuations in nanoscale processes.
Interface Configuration
Output signal: Analog voltage (such as 0-10V DC) or digital signal (such as RS485), supporting seamless integration with equipment control systems.
Communication protocol: Compatible with industry standard protocols such as SECS/GEM and Modbus, enabling remote monitoring and data recording.
Physical specifications
Size: Approximately 9 x 5 x 5 inches, suitable for embedded installation.
Material: Stainless steel or ceramic membrane, corrosion-resistant and high temperature resistant (such as 300 ° C), suitable for various process gas environments.
Environmental requirements
Working temperature: -5 ° C to 45 ° C (refer to the parameters of the same series product AMAT 0190-09399).
Protection level: IP65, dustproof and waterproof, suitable for clean room environment.
Product Performance
High precision and stability
Linearity: better than ± 0.2% FS, ensuring the accuracy of pressure measurement and avoiding uneven film thickness or etching depth deviation caused by pressure fluctuations.
Response time:<100ms, fast feedback of pressure changes, support for dynamic process adjustment (such as pulse gas injection).
Reliability and Durability
Anti vibration design: internal structural reinforcement that can withstand mechanical vibrations during equipment operation (such as plasma shock from etching machines).
Self calibration function: Regular automatic calibration reduces drift errors during long-term use and lowers maintenance costs.
Compatibility and Scalability
Multi gas compatibility: supports multiple process gases (such as O ₂, CF ₄, NF ∝), and adapts to the pressure capacitance characteristics of different gases through software configuration.
Multi channel integration: can form an array with multiple pressure gauges to achieve three-dimensional monitoring of chamber pressure distribution.
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